„C4F“

Suchergebnisse

1.000+ Treffer

• C4F8 plasma treatment for the modification of the focal length of liquid-based plano-convex lenses on different substrates
  Gerhard, Christoph ; Mielke, Gerrit ; Tasche, Daniel
• Application of plasma catalysis system for C4F8 removal
  Chen, Ya Sheng ; Pan, Kuan Lun ; Chang, Moo Been
• Global emissions of perfluorocyclobutane (PFC-318, c-C4F8) resulting from the use of hydrochlorofluorocarbon-22 (HCFC-22) feedstock to produce polytetrafluoroethylene (PTFE) and related fluorochemicals
  Mühle, Jens ; Kuijpers, Lambert J. M. ; Stanley, Kieran M. ; Rigby, Matthew ; Western, Luke M. ; Kim, Jooil ; Park, Sunyoung ; Harth, Christina M. ; Krummel, Paul B. ; Fraser, Paul J. ; O'Doherty, Simon ; Salameh, Peter K. ; Schmidt, Roland ; Young, Dickon ; Prinn, Ronald G. ; Wang, Ray H. J. ; Weiss, Ray F. 2022 Universitätsbibliothek Johann Christian Senckenberg
• Development of water/oil repellent and heat-resistant aromatic poly(ether ketone)s bearing 3,5-(C4F9)2C6H3 groups at both ends
  Konta, Haruki ; Maeyama, Katsuya
• The Effect of Buoyancy Convection and Geometric Variation on Temperature Field of C4F7N-Filled Gas-Insulated Metal Transmission Line
  Chen, Zihan ; Mao, Xintong ; Liu, Wei ; Zhao, Huilong ; Bo, Bin ; Yu, Jia-Jia
• Reactions of 1,4-diphenylbut-1-en-3-yne and 1,4-diferrocenylbuta-1,3-diyne with Ru3(CO)10(μ-dppm). Unusual structures of the clusters Ru3(CO)5(η-CO)(η-dppm){μ3-C4Ph2(CH=CHPh)2} (two isomers) and Ru3(CO)5(η-CO)(η-dppm){μ3-C4Fc2(CH≡CFc)2}
  Koridze, A. A. ; Zdanovich, V. I. ; Lagunova, V. Yu ; Petukhova, I. I. ; Doglushin, F. M.
• Influence of C4F8/Ar/O2 plasma etching on SiO2 surface chemistry
  Krastev, V. ; Reid, I. ; Galassi, C. ; Hughes, G. ; McGlynn, E.
• Arc Erosion Behavior of Cu/Ti3SiC2 Cathodes in c-C4F8 Gas as a Substitute for SF6 Gas
  Liu, Zhuhan ; Feng, Yi ; Jiang, Ningyuan ; Zhou, Zijue ; Wang, Fei ; Li, Xinchao ; Yu, Miao
• Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures
  Efremov, A. M. ; Bobylev, A. V. ; Kwon, K.-H
• PE-CVD of Fluorocarbon/SiO Composite Thin Films Using C4F8 and HMDSO
  Shirafuji, Tatsuru ; Miyazaki, Yasuo ; Hayashi, Yasuaki ; Nishino, Shigehiro
• Dissociative electron attachment to c-C4F8 molecules and clusters
  Mészáros, Dušan ; Papp, Peter ; Matejčík, Štefan
• Thermodynamische Eigenschaften von Octafluorcyclobutan C4F8 (R C318) [CFRC]
  Matthias, H. ; Löffler, Hans-Jürgen 1965 Inst. für Thermodynamik u. Kältetechnik, Techn. Univ.
• Creation and Recombination of Free Radicals in Fluorocarbon Plasma Polymers: An Electron Spin Resonance Study
  Haupt, Michael ; Barz, Jakob ; Oehr, Christian
• Rate Coefficient for Self-Association Reaction of CF2 Radicals Determined in the Afterglowof Low-Pressure C4F8 Plasmas
  Suzuki, C. ; Sasaki, K. ; Kadota, K.
• Genetics of complement C4. Two homoduplication haplotypes C4S C4S and C4F C4F in a family
  Bruun-Petersen, G. ; Lamm, Lars U. ; Jacobsen, Bodil K. ; Kristensen, Tom
• Numerical Study on Comparison of Negative and Positive Surface Discharge in c-C4F8/CF3I/CO2 Gas Mixture
  Fan, Binhai ; Zhou, Xiaoli ; Qian, Yong ; Zang, Yiming
• Parameters of Gaseous Phase and Kinetics of Reactive Ion Etching of SiO2 in CF4/C4F8/Ar/He Plasma
  Efremov, A. M. ; Kwon, K.-H
• Modifying α-Al2O3 with cerium, zirconium, and sulfate for catalytic removal of C4F8
  Machmud, Amir ; Chang, Moo Been
• c ‐C 4 F 8 Plasmas for the Deposition of Fluorinated Carbon Films
  Terriza, Antonia ; Macías‐Montero, Manuel ; López‐Santos, Maria C. ; Yubero, Francisco ; Cotrino, José ; González‐Elipe, Agustín R.
• A DFT Study on the Direct CF2 Fragmentation Mechanisms of 1,3-C4F6 and 1,3-C4F6 + in Plasma
  Choi, Heechol ; Park, Young Choon ; Im, Yeon-Ho ; Kwon, Deuk-Chul ; Chung, Sang-Young